Second International Symposium Antwerp, 30 September-2 October Opening. Robert A. Hartman
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1 Second International Symposium Antwerp, 30 September-2 October 2003 Opening Robert A. Hartman
2 Welcome!! YOU Symposium EUVL Key note address Antwerp Second International Symposium Rob Hartman 2
3 Welcome!! YOU Symposium EUVL Key note address Antwerp Second International Symposium Rob Hartman 3
4 Who are you? You are here with 323 persons (per 8:00 hours) 30 % from the Americas 28 % from Asia 42 % from Europe You have submitted more than 170 abstracts Antwerp Second International Symposium Rob Hartman 4
5 Welcome!! YOU Symposium EUVL Key note address Antwerp Second International Symposium Rob Hartman 5
6 Hilton 3rd Floor Antwerp Second International Symposium Rob Hartman 6
7 Symposium 50 papers in 9 sessions All issue of the top ten list of the first Symposium are addressed Antwerp Second International Symposium Rob Hartman 7
8 EUV Lithography: Critical Issues (10/17/2002) 1. Source output (2) 2. Defect-free multilayer coated mask blank mfg, including inspection (1) 3. Source & condenser optics reliability (5) 4. CoO of EUV lithography (3) 5. Defect-free patterned mask manufacturing/commercial availability (4) 6. Reticle defect protection (from inspection through exposure) (6) 7. Effective contamination control of optical path (lifetime) (7) 8. High NA optics manufacturing (9) 9. Thermal management of reticle & projection optics at high throughput (8) 10. Resist high sensitivity at low power with low LER (new) Source: st International 1 Antwerp EUV Second Symposium International Symposium (2002 Steering Rob Committee) Hartman 8 O
9 Symposium 50 papers in 9 sessions All issue of the top ten list of the first Symposium are addressed Tuesday Wednesday Thursday Source 1 Tool Optics Mask 1 Mask 2 Metrology Resist Contamination Source 2 Antwerp Second International Symposium Rob Hartman 9
10 Oral Presenters Please check with your Session Chairs 15 min prior to start of session Please check whether your presentation on the conference laptop is OK and the right version Please check with AV desk 5 min prior to start of your presentation to connect the wireless microphones Please stick to the timing Antwerp Second International Symposium Rob Hartman 10
11 Symposium 120 posters! Two sessions scheduled Posters are important Use your arrow to vote for your most appreciated poster Antwerp Second International Symposium Rob Hartman 11
12 Poster presenters Posters can be set up from the first break on Tuesday Please be present at your poster during the poster session to address questions from attendees You can leave the poster in the poster room until Thursday noon Antwerp Second International Symposium Rob Hartman 12
13 It all happens at the Hilton, on the third floor except dinner tonight you have to walk to Antwerp Second International Symposium Rob Hartman 13
14 Hilton Alfa Theater Hotel Banquet location Elzenveld Antwerp Second International Symposium Rob Hartman 14
15 Symposium Due to the large number of participants we have lunch in multiple rooms The lunch regional updates are not possible due to this To avoid overload we do not reschedule them Antwerp Second International Symposium Rob Hartman 15
16 Welcome!! YOU Symposium EUVL Key note address Antwerp Second International Symposium Rob Hartman 16
17 EUVL Industry appears to be convening on introduction of EUVL in 2009 Tools required in 2007 Some early pilot production likely as early as 2008 Antwerp Second International Symposium Rob Hartman 17
18 Welcome!! YOU Symposium EUVL Key note address Antwerp Second International Symposium Rob Hartman 18
19 Key note EUVL in perspective Who better can tell this than Antwerp Second International Symposium Rob Hartman 19
20 Chuck W. Gwyn General Manager and Program Director for the EUV LLC Consortium, responsible for managing the technical development of EUV lithography tools in partnership with the DOE laboratories and commercial suppliers. B.S. in Electrical Engineering, University of Kansas; M.S. and Ph.D. in Electrical Engineering, University of New Mexico IEEE Fellow Antwerp Second International Symposium Rob Hartman 20
21 Antwerp Second International Symposium Rob Hartman 21
22 Antwerp Second International Symposium Rob Hartman 22
23 ask critical questions be open minded learn from your colleagues but switch of your cell phone!! Enjoy the Symposium Antwerp Second International Symposium Rob Hartman 23
24 Antwerp Second International Symposium Rob Hartman 24
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