This educational seminar discusses creating, measuring, and troubleshooting Ultra-High Vacuum ( Torr) systems.
|
|
- Roland Stephens
- 6 years ago
- Views:
Transcription
1 This educational seminar discusses creating, measuring, and troubleshooting UltraHigh Vacuum ( Torr) systems. Specifically, today s talk will cover: Brief review of High Vacuum (Characteristics, Pumps & Gauges) Applications requiring UltraHigh Vacuum UltraHigh Vacuum Gauges CryoPumps & UHV Pumps (detailed description of Diode & Noble Diode Sputter Ion Pumps) Challenges in achieving UHV Pressures
2 This educational seminar discusses creating, measuring, and troubleshooting UltraHigh Vacuum ( Torr) systems. Specifically, today s talk will cover: Brief review of High Vacuum (Characteristics, Pumps & Gauges) Applications requiring UltraHigh Vacuum UltraHigh Vacuum Gauges CryoPumps & UHV Pumps (detailed description of Diode & Noble Diode Sputter Ion Pumps) Challenges in achieving UHV Pressures Previous Webinars (Vacuum Fundamentals, Rough Vacuum, High Vacuum) are available for download at:
3 High Vacuum Review: Characteristics Particles are moving in Molecular Flow Long Mean Free Path (MFP) Few collisions with other molecules Large pump inlets (high conductance) key to achieving efficient pumping Gas Composition is constant through High Vacuum (80% H 2 O, 10% N 2, 10% CO)
4 High Vacuum Review: Characteristics Particles are moving in Molecular Flow Long Mean Free Path (MFP) Few collisions with other molecules Large pump inlets (high conductance) key to achieving efficient pumping Gas Composition is constant through High Vacuum (80% H 2 O, 10% N 2, 10% CO) Chamber Volume is NOT the dominant factor governing pumpdown time Surface Area, Material Type and Pump Speed determine ultimate pressure Pressure (Torr) Volume Pressure Decay Desorption Diffusion 10 9 Time
5 High Vacuum Review: Pumps and Gauges Two types High Vacuum Pumps: Capture pumps (CryoPump) Displacement pumps (TurboPump & Diffusion Pump) No High Vacuum Pumps can compress gas to Atmosphere!
6 High Vacuum Review: Pumps and Gauges Two types High Vacuum Pumps: Capture pumps (CryoPump) Displacement pumps (TurboPump & Diffusion Pump) No High Vacuum Pumps can compress gas to Atmosphere! IONIZATION GAUGES used to measure High Vacuum pressures Hot Ionization Gauge (BA) Cold Cathode & IMG Gauges Wide Range gauges use multiple technologies in a single housing (e.g. IMG & Pirani).
7 UHV Applications 760 Torr 25 Torr 7.5 e4 Torr 7.5 e7 Torr 7.5 e10 Torr 7.5 e12 Torr Pickup & Conveyance Food Packaging Freeze Drying Incandescent Lamps Heat Treatment Surface Coating Thin Film Deposition Semiconductors Electron Mass Microscopy Spectrometry Nanotechnology SubAtomic Research Space Research
8 Vacuum Measurement Technologies Different technologies are required to measure the vacuum pressure in different vacuum regions RANGE GAUGE TYPE EXAMPLES Rough Vacuum Atm 10 3 Mechanical Deflection & Thermal Transfer Gauges Bourdon Gauge Capacitance Manometer Thermocouple, Convection, Pirani High Vacuum Ultra High Vacuum Mechanical Deflection & Ionization Gauges < Ionization Gauges & Gas Analyzers Capacitance Manometer Hot Filament Gauge (BA) IMG / Penning Gauge UHV Ionization Gauges Residual Gas Analyzer (RGA) Ion Pump Current
9 UltraHigh Vacuum Gauges UltraHigh Vacuum High Vacuum Rough Vacuum Bourdon Gauge Capacitance Manometer Thermocouple Gauge Pirani Gauge Hot Fil. Ion Gauge IMG / Penning Gauge Residual Gas Analyzer Spinning Rotor Gauge Pressure (Torr) Confidentiality Label April 3,
10 Modified Hot Filament Ion Gauge How it Works: Overcome Glass Permeation and Xray Limit (measurement inaccuracy caused by Xrays striking central filament) No Glass Envelope eliminate permeation leak through glass Smaller Structures reduce measurement error caused by Xrays Allmetal Seals eliminate permeation through oring Accuracy: ± 20% of full scale within a pressure decade Can read to 5 x Torr vs 3 x Torr for Glass Envelope BA e electron neutral gas atom Electrons Collide with Neutral Atoms or Molecules Controller Filament e e e Ion Collector e Grid Gas Relative Sensitivity Ar 1.2 CO H He 0.16 H N Ne 0.25 O Confidentiality Label April 3,
11 Inverted Magnetron Gauge How it Works: Anode is a rod in the axis of an almost closed cylinder (Cathode) End discs of the of the cathode are shielded guard rings Prevents field emission affecting ion current measurement Anode at ~4 kv vs 2 kv for Magnetron and is parallel to the gauge s magnetic field. Superior starting characteristics (vs Cold Cathode Gauge) Stable Pressure reading and Fast Response 10 3 to Torr Operating Range Accuracy: ± 50% within a pressure decade
12 High Vacuum Pumps: Operating Range UltraHigh Vacuum High Vacuum Rough Vacuum Turbo Pump Drag Pump Vapor Jet Pump Cryo Pump LN 2 Trap P (Torr) Confidentiality Label April 3,
13 High Vacuum Pumps: Operating Range UltraHigh Vacuum High Vacuum Rough Vacuum Turbo Pump Drag Pump Vapor Jet Pump Cryo Pump LN 2 Trap P (Torr) Confidentiality Label April 3,
14 Cryogenic Pump Operation: UHV All CryoPumps require REGENERATION when Cold Heads become saturated (drop in pumping speed/increase in 2 nd stage temperature) Confidentiality Label April 3,
15 PASSIVE Cryogenic Trap (w/ Valve) Confidentiality Label April 3,
16 UHV Pumps Confidentiality Label April 3,
17 UHV Pump Operating Ranges Ultra High Vacuum High Vacuum Pump High Vacuum Roughing Pumps Rough Vacuum Sputter Ion Pump Titanium Sublimation Pump Non Evaporable Getter P (Torr) Confidentiality Label April 3,
18 Sputter Ion Pump: Anatomy of a Diode Element
19 Titanium Cathode Sputter Ion Pump: Anatomy of a Diode Element Single Cell Diode Pump Element Stainless Steel Anode Anode Cross Section
20 Crosssection of a Diode Cell X = Magnetic Field INTO the Page
21 Voltage Potential Creates Plasma (Free Electrons!) e X = Magnetic Field INTO the Page
22 Electrons Accelerated by Magnetic Field e M Resulting in Formation of POSITIVE Ions
23 Ions Accelerated by Electric Field M What Happens Next Depends on Which IONS are Formed
24 Lighter Ions are Accelerated Towards the Cathodes He & H 2
25 . and Driven Into Cathode Material (Titanium) He & H 2 Permanently Trapping Them in the Cathode Structure
26 Larger Molecules Driven into Cathodes Larger Molecules
27 Sputtering TITANIUM Onto Anode Surface
28 Getterable Gas Species React with Sputtered Titanium TiO Forming Stable Compounds
29 PROBLEM: Noble Gases are NonReactive April 3, 2017 Confidentiality Label 25 1 H Li Be Na Mg K Ca Rb Sr Cs Ba Fr 88 Ra He N O F Ne C B Si P S Cl Ar 13 Al As Se Br Kr Ge Ga Sn Sb Te I Xe 49 In Fe Co Ni Cu Zn 25 Mn Rh Pd Ag Cd Ru Tc Os Ir Pt Au Hg 75 Re Pb Bi Po 85 At 86 Rn 81 Tl Ti V Cr Sc Nb Mo Zr Y Hf Ta W La SERIES Ac SERIES 69 Tm Yb Lu Er Ho Fm 101 Md 102 No 103 Lr 99 Es 62 Sm Eu Gd Tb Dy 61 Pm 95 Am 96 Cm 97 Bk 98 Cf 94 Pu 93 Np Ce Pr Nd La Pa U Th Ac La Series Ac Series
30 NOBLE Gas Ions Accelerate Towards the Cathodes Ne Ar Kr Xe
31 but are NOT Permanently Trapped in Cathodes Ne Ar Kr Xe
32 but are NOT Permanently Trapped in Cathodes Larger Molecules
33 but are NOT Permanently Trapped in Cathodes
34 and are Liberated as TITANIUM is Removed Ne Ar Kr Xe NOBLE Gases are NOT Permanently Trapped in the DIODE PUMP s Titanium Cathode Structure
35 Diode Pump: Best AllRound UHV Pump DIODE (2x Ti Cathodes) Highest Pumping Speed & Capacity for Hydrogen (2x Flat Titanium Cathodes) Highest Pumping Speed for Chemically Reactive ( Getterable ) Gases (CO, CO 2, H 2, N 2, O 2 etc) Not Recommended for pumping noble gases Argon instability after ~ 20 h at 10 6 Torr 22 Ti (47.9) Diode Cathode & Anode
36 NOBLE DIODE: Solving Argon Instability Problem NOBLE DIODE (1x Ti, 1x Ta Cathodes) Tantalum cathode reflects NEUTRALS with High Energy (ie. have greater ability to penetrate Titanium on Anode Surface) Reduced H 2 Pumping Speed (1x Titanium Cathode & 1x Tantalum Cathodes) through entrapment Reduced Pumping Speed for ALL Getterable Gases (less Titanium available to be sputtered) 22 Ti (47.9) 73 Ta (180.95) Noble Diode Cathode (Ti Plate) & Anode
37 How it Works: Noble Diode Pump TANTALUM is more dense than Ti H 2
38 How it Works: Noble Diode Pump TANTALUM is more dense than Ti H 2 Ions are Neutralized and Reflected by the TANTALUM Cathode with HIGH ENERGY H 2 They become reionized in the Electron Cloud (not shown) and are driven towards the TITANIUM Cathode
39 SOLUTION: Noble Diode Pump Uses 1x Tantalum Cathode H 2 Lighter Gases are Again Permanently Trapped in the Titanium Cathode Structure
40 Larger Molecules Driven into TITANIUM Cathode Larger Molecules
41 Sputtering (LESS!) TITANIUM Onto Anode Surface
42 Ions Striking Ta Cathode Reflected as High Engergy Neutrals Larger Molecules With enough energy to penetrate the TITANIUM coating on the Anode: Since no sputtering occurs at the Anode, they are permanently trapped (and coated with fresh Ti after)
43 Getterable Gas Species React with Sputtered Titanium TiO Forming Stable Compounds
44 NOBLE Gas Ions Accelerate Towards the Cathodes Ne Ar Kr Xe
45 and are again lightly buried in the TITANIUM Cathode Ne Ar Kr Xe
46 and are again lightly buried in the TITANIUM Cathode Ne Ar Kr Xe but they are REFLECTED as High Energy Neutrals off the TANTALUM Cathode (Can penetrate the Titanium layer on the Anode Surface)
47 NOBLE Gas Molecules Can Be Covered by Sputtered Titanium Ne Ar Kr Xe Effectively Trapping Them on the Anode Surface
48 NOBLE Gas Molecules Can Be Covered by Sputtered Titanium Ne Ar Kr Xe Unlike NOBLE Gas Ions on the TITANIUM Cathode (that are again released by subsequent bombardments)
49 Triode Pumps (inc. StarCell) Use Modified Cathode Geometry
50 Alternate Cathode Designs Fore Specific Gases TRIODE Anode is grounded; Cathode consists of STRIPS of TITANIUM at Negative voltage Noble gas ions have glancing collisions with Cathodes and then become high energy neutrals Neutrals resting (even briefly) on the Anode and Pump wall can be covered up by freshly sputtered Titanium No sputtering occurs on the pump walls or at the Anode so Noble gas pumping is stable Chemically active gases are also pumped on the walls and Anode (Hydrogen is Gettered and diffused into cathode structure)
51 StarCell Design: The Ultimate Triode Pump! STAR CELL Optimized Triode Design: Star shaped cutouts in TITANIUM Cathode provide maximum pumping speed for Noble Gases optimized lifetime vs Diode Pump (80K hours vs. 50K hours) ~20 times longer Argon stability than Noble Diode Pumping speed for Getterable gases and Hydrogen comparable to Noble Diode Pump Higher Hydrogen capacity than Noble Diode
52 Ion Pump Controller ION PUMP CONTROLLER Precision power supplies ( W) required for each Ion Pump Agilent Ion Pump controller software ramps voltage to ignite plasma Current (between Cathode and Anode) can be measured to indicate the Vacuum Pressure ( Cold Cathode ) Step Voltage feature optimizes sputtering of Titanium Voltage reduced after ignition (reducing Leakage Current) which allows pressures in Torr range to be measured
53 Using ION PUMP Current as UHV Gauge ION PUMP CURRENT Current in an ion pump is linearly proportional to the pressure so the ion pump can be used to roughly read the pressure Limitation at low pressure is given by the leakage current (roughly Ion Current Potential)
54 Getter Pumps: Pumping without Sputtering There Are Two Ways of Producing a Clean Gettering Surface: NonEvaporable Getters NEG: by heating an oxidized getter (i.e. powder coated metallic strip) to a temperature high enough to diffuse oxygen from the surface into the getter bulk. Evaporable Getters TSP: the active surface is obtained by "in situ" deposition under vacuum of a fresh clean metallic film Confidentiality Label April 3,
55 Titanium Sublimation Pumps Ti Ball Heater Mini TiBall Source TiBall Source (35 grams) Mini TiBall Source (15 grams) 3 Filaments Titanium Filaments (4 1/2 grams) Confidentiality Label April 3,
56 Ion Pump Selection Criteria TSP Triode Star Cell Diode Noble Diode Hydrogen Helium Water Methane Nitrogen O 2, CO, CO Argon Null 0 Poor 1 Good 2 Excellent 3 Outstanding 4 Combination Star Cell TSP is best combination for a wide variety of gases Diode pump has optimum pumping speed for Hydrogen
57 UHV System Schematic UHV Chamber Roughing Valve UHV Gauge Foreline Valve Scroll (Rough) Pump Turbo (HV) Pump HiVac Valves Ion & TSP (UHV) Pumps Confidentiality Label April 3,
58 UHV System Operation UHV Chamber Torr Roughing Valve UHV Gauge Foreline Valve Scroll (Rough) Pump Turbo (HV) Pump HiVac Valves Ion & TSP (UHV) Pumps Confidentiality Label April 3,
59 UHV System Operation UHV Chamber Torr Roughing Valve UHV Gauge Foreline Valve Scroll (Rough) Pump Turbo (HV) Pump HiVac Valves Ion & TSP (UHV) Pumps Confidentiality Label April 3,
60 UHV System Operation UHV Chamber < 10 9 Torr Roughing Valve UHV Gauge Foreline Valve Scroll (Rough) Pump Turbo (HV) Pump HiVac Valves Ion & TSP (UHV) Pumps Confidentiality Label April 3,
61 Troubleshooting UltraHigh Vacuum Systems Permeation Real Desorption Leaks Outgassing (H 2 O, Solvents) Permeation Surface (He, H 2 Conditions ) & Trapped Diffusion Volumes: Materials: Leaks: Internal Leaks Virtual Leaks Virtual Leaks Process Real Leaks Diffusion (H 2 ) Backstreaming (Oil, He) S D Confidentiality Label April 3,
62 Troubleshooting UltraHigh Vacuum Systems Permeation Real Desorption Leaks Outgassing (H 2 O, Solvents) Permeation Surface (He, H 2 Conditions ) & Trapped Diffusion Volumes: Materials: Leaks: Virtual Leaks Virtual Leaks Real Leaks Diffusion (H 2 ) Backstreaming (Oil, He) S D Confidentiality Label April 3,
63 Troubleshooting UltraHigh Vacuum Systems Permeation Real Desorption Leaks Outgassing (H 2 O, Solvents) Permeation Surface (He, H 2 Conditions ) & Trapped Diffusion Volumes: Materials: Leaks: Virtual Leaks Virtual Leaks Diffusion (H 2 ) Backstreaming (Oil, He) S D Confidentiality Label April 3,
64 Troubleshooting UltraHigh Vacuum Systems Permeation Real Desorption Leaks Permeation Surface (He, H 2 Conditions ) & Trapped Diffusion Volumes: Materials: Leaks: Outgassing (H 2 O, Solvents) Diffusion (H 2 ) Backstreaming (Oil, He) S D Confidentiality Label April 3,
65 Troubleshooting UltraHigh Vacuum Systems Permeation Real Leaks Permeation Surface (He, H 2 Conditions ) & Trapped Diffusion Volumes: Materials: Leaks: Outgassing (H 2 O, Solvents) Diffusion (H 2 ) Backstreaming (Oil, He) S D Confidentiality Label April 3,
66 Troubleshooting UltraHigh Vacuum Systems Permeation Real Leaks Permeation Surface (He, H 2 Conditions ) & Trapped Volumes: Materials: Leaks: Outgassing (H 2 O, Solvents) Diffusion (H 2 ) Backstreaming (Oil, He) S D Confidentiality Label April 3,
67 Troubleshooting UltraHigh Vacuum Systems Permeation Real Leaks Permeation Surface (He, H 2 Conditions ) & Trapped Volumes: Materials: Leaks: Outgassing (H 2 O, Solvents) Diffusion (H 2 ) Back Backstreaming (Oil, He) streaming S D Confidentiality Label April 3,
68 Locating REAL Leaks Helium Mass Spec Leak Detection (HMSLD) is a very sensitive technique typically used to locate REAL ( outsidein ) leaks in UHV Systems. Theory of Operation Mass Spectrometer tuned to detect only Helium Why we use Helium? Highly mobile, inert, (relatively) available & inexpensive, low surface absorption (easy to pump away) present in air in low quantity ( 5 ppm)
69 Locating REAL Leaks Helium Mass Spec Leak Detection (HMSLD) is a very sensitive technique typically used to locate REAL ( outsidein ) leaks in UHV Systems. Theory of Operation Mass Spectrometer tuned to detect only Helium Why we use Helium? Highly mobile, inert, (relatively) available & inexpensive, low surface absorption (easy to pump away) present in air in low quantity ( 5 ppm) Ion Source Gas Flow Magneti c Field x x x x x x x x x x x x x x x x x x x x x x x x x x Detector
70 Eliminating VIRTUAL Leaks: Desorption & Diffusion Desorption & Diffusion Minimize the amount of moisture entering the vacuum system, and accelerate the rate of Desorption and Diffusion of gases that ARE in the system Keep vacuum system interior CLEAN and free of moisture When necessary, vent chamber with inert gas Minimize exposure of clean parts to air Choose materials with high bakeout temperatures EFFECTIVENESS OF BAKEOUT IS LINEAR WITH TIME BUT EXPONENTIAL WITH TEMPERATURE Confidentiality Label April 3,
71 Pressure (mbar) Bake Out Example First Bake Was Done With No Insulation and Uneven Heating Second Bake Used Insulation to Improve Heating 75 L/s Rate of Rise Test 1.00E E E08 Second bake First bake 1.00E E Time (sec) Confidentiality Label April 3,
72 Materials Selection for UHV Choose UHV Vacuum System materials based on: 1. Vacuum Compatibility Outgassing Rates (available online; temp & surface finish specific) Permeation Rates (available online for metals and elastomers) BakeOut Temperature (critical in achieving UHV pressures!) 2. Mechanical Properties Physical Strength Conductivity Radiation
73 Typical Cleaning Material Procedure Wash in hot water with detergent Use ultrasonic bath if available Rinse with hot demineralized water and dry Ultrasonic wash in hot solvent Vapour wash in solvent vapour Rinse with hot demineralized water Vacuum bake at 200 C Confidentiality Label April 3,
74 Some Typical Chemical Cleaning Agents (CERN) Agent Examples Advantages Disadvantages Disposal Water Cheap; readily available Need to use demineralised for cleanliness. Not a strong solvent To foul drain. Alcohols Ethanol, methanol, isopropanol Relatively cheap, readily available, quite good solvents. Need control affect workers, some poisonous, some flammable, stringent safety precautions. Evaporate or controlled disposal. Organic solvents Acetone, ether, benzene Good solvents, evaporate easily with low residue. Either highly flammable or carcinogenic. Usually evaporate! Detergents Aqueous solutions, non toxic, cheap and readily available, moderate solvents. Require careful washing and drying of components. Can leave residues. To foul drain after dilution. Alkaline degreasers Almeco, sodium hydroxide Aqueous solutions, non toxic, moderate solvents. Can leave residues and may deposit particulate precipitates. Requires neutralisation, then dilution to foul drain. Citric acid Citrinox Cheap and readily available, quite good solvents. Require careful washing and drying of components. Can leave residues. Unpleasant smell. To foul drain after dilution Confidentiality Label April 3,
75 Possible Sources of Leaks in UHV Virtual Leaks Residual solvents (following maintenance cleaning) Liquid leaks such as cooling fluids Trapped volumes of Gas or Liquid Trapped space under nonvented hardware UHV UHV Gasses or solvents in spaces With Poor Conductance High Vapor Pressure materials Porous materials exposed to liquid or atmosphere
76 Possible Sources of Leaks in UHV Virtual Leaks Residual solvents (following maintenance cleaning) Liquid leaks such as cooling fluids Trapped volumes of Gas or Liquid Trapped space under nonvented hardware Permeation Leaks All metal seals (minimize use of O ring seals where practical) Use less porous materials Insulating Vacuum UHV UHV Gasses or solvents in spaces With Poor Conductance High Vapor Pressure materials Porous materials exposed to liquid or atmosphere
77 Possible Sources of Leaks in UHV Virtual Leaks Residual solvents (following maintenance cleaning) Liquid leaks such as cooling fluids Trapped volumes of Gas or Liquid Trapped space under nonvented hardware Permeation Leaks All metal seals (minimize use of O ring seals where practical) Use less porous materials Insulating Vacuum UHV UHV Gasses or solvents in spaces With Poor Conductance High Vapor Pressure materials Porous materials exposed to liquid or atmosphere
78 Reducing Backstreaming Through Compression: XHV Outgassing (H 2 O, Solvents) Diffusion (H 2 ) Backstreaming (Oil, He) S D Extra DECADES of Compression (virtually) Eliminate Backstreaming and should allow pressures into Torr Range with appropriate Baking and Material selection S D Confidentiality L April 3, 2 62
79 Summary: UltraHigh Vacuum
80 Summary: UltraHigh Vacuum Molecular Flow requires pumps with high conductance inlets mounted as close as possible to the vacuum system
81 Summary: UltraHigh Vacuum Molecular Flow requires pumps with high conductance inlets mounted as close as possible to the vacuum system Modified Ionization Vacuum Gauges are most suitable for UltraHigh Vacuum; Gauges are gas type dependent
82 Summary: UltraHigh Vacuum Molecular Flow requires pumps with high conductance inlets mounted as close as possible to the vacuum system Modified Ionization Vacuum Gauges are most suitable for UltraHigh Vacuum; Gauges are gas type dependent UltraHigh Vacuum Pumps: (Sputter Ion, Getter, Titanium Sublimation) complement a UHV System s High Vacuum Pumps (TurboMolecular, Cryo, LN2, Vapor Jet/Diffusion)
83 Summary: UltraHigh Vacuum Molecular Flow requires pumps with high conductance inlets mounted as close as possible to the vacuum system Modified Ionization Vacuum Gauges are most suitable for UltraHigh Vacuum; Gauges are gas type dependent UltraHigh Vacuum Pumps: (Sputter Ion, Getter, Titanium Sublimation) complement a UHV System s High Vacuum Pumps (TurboMolecular, Cryo, LN2, Vapor Jet/Diffusion) In UltraHigh Vacuum, OUTGASSING (Desorption and Diffusion must be managed: Bakeout ESSENTIAL for achieving UHV pressures
84 Summary: UltraHigh Vacuum Molecular Flow requires pumps with high conductance inlets mounted as close as possible to the vacuum system Modified Ionization Vacuum Gauges are most suitable for UltraHigh Vacuum; Gauges are gas type dependent UltraHigh Vacuum Pumps: (Sputter Ion, Getter, Titanium Sublimation) complement a UHV System s High Vacuum Pumps (TurboMolecular, Cryo, LN2, Vapor Jet/Diffusion) In UltraHigh Vacuum, OUTGASSING (Desorption and Diffusion must be managed: Bakeout ESSENTIAL for achieving UHV pressures Materials Selection (permeation & bakeability ) and Backstreaming must be dealt with to achieve lowest ultimate pressure
85 Summary: UltraHigh Vacuum Molecular Flow requires pumps with high conductance inlets mounted as close as possible to the vacuum system Modified Ionization Vacuum Gauges are most suitable for UltraHigh Vacuum; Gauges are gas type dependent UltraHigh Vacuum Pumps: (Sputter Ion, Getter, Titanium Sublimation) complement a UHV System s High Vacuum Pumps (TurboMolecular, Cryo, LN2, Vapor Jet/Diffusion) In UltraHigh Vacuum, OUTGASSING (Desorption and Diffusion must be managed: Bakeout ESSENTIAL for achieving UHV pressures Materials Selection (permeation & bakeability ) and Backstreaming must be dealt with to achieve lowest ultimate pressure Techniques for troubleshooting HIGH VACUUM applications include Pumpdown Curves, RateofRise Tests and Helium Mass Spec Leak Detection
86 Vacuum Education Programs For Information on Agilent s Vacuum Technology Products and Services, please vplcustomercare@agilent.com or call , and select option 3. To learn about more Agilent Vacuum Technology Education programs, including UHV Seminars at your institution Scheduled multiday classes in Vacuum Practice and Leak Detection Custom multiday classes at your site Other custom training classes to fit your needs Please Robin Arons (robin.arons@agilent.com), or call Customer Care at (Option 3) for more details on these programs Confidentiality Label April 3,
The Principles of Vacuum Technology
The Principles of Vacuum Technology Vacuum Terminology Vacuum units Vacuum regimes How to measure vacuum. Gauge designs. How to create vacuum Pump classifications and designs UHV compatibility considerations
More informationIntroduction of Vacuum Science & Technology. Diffusion pumps used on the Calutron mass spectrometers during the Manhattan Project.
Introduction of Vacuum Science & Technology Diffusion pumps used on the Calutron mass spectrometers during the Manhattan Project. 1 What is a vacuum? 760 mm Hg Vacuum ATM A vacuum is defined as less than
More informationThis educational seminar discusses creating, measuring, and troubleshooting Rough Vacuum.
This educational seminar discusses creating, measuring, and troubleshooting Rough Vacuum. Specifically, today s talk will cover: Brief review of Vacuum Fundamentals Applications Using Rough Vacuum Rough
More informationVacuum Science Techniques and Applications Dan Dessau Adv. Lab 2007
Vacuum Science Techniques and Applications Dan Dessau Adv. Lab 2007 Vacuum increases the mean-free-path of gas molecules. Vacuum prevents chemical reaction. Vacuum removes contaminants from surfaces. Vacuum
More informationThe Broadest Gauging Line in the Industry
The Broadest Gauging Line in the Industry Vacuum Measurement Varian s broad line of vacuum gauge controllers and gauge tubes are the most reliable, accurate, and economical means of measuring, monitoring,
More informationHow To Use Getters and Getter Pumps
A Journal of Practical and Useful Vacuum Technology From By Phil Danielson How To Use Getters and Getter Pumps Gettering is a vacuum pumping technology that has been with us, in many forms, for almost
More informationVacuum Systems and Cryogenics for Integrated Circuit Fabrication Technology 01
INAOE. Tonantzintla, Mexico. 2010-06-23. June 23 rd, 2010 Vacuum Systems and Cryogenics for Integrated Circuit Fabrication Technology 01 Joel Molina INAOE Microelectronics Group jmolina@inaoep.mx 1 Vacuum
More informationThe Experts in Vacuum Solutions
By Woodrow Farrow - Reprinted with permission from Specialty Gas Report Vacuum: a space that is relatively empty of matter, especially when that void has been created through artificial means. The earth
More informationE SC 412 Nanotechnology: Materials, Infrastructure, and Safety Wook Jun Nam The Pennsylvania State University
E SC 412 Nanotechnology: Materials, Infrastructure, and Safety Wook Jun Nam Unit 2 Infrastructure Lecture 6 More on Vacuum Systems, Part III Unit Outline Infrastructure * What is it? * Why do we need it
More informationA Journal of Practical and Useful Vacuum Technology. By Phil Danielson
A Journal of Practical and Useful Vacuum Technology From By Phil Danielson Thermal Conductivity Gauges Thermal conductivity pressure gauges are extremely common in vacuum technology, but an understanding
More informationShort Introduction to Cryo-Pumps and Refrigerators. Dr Graham Rogers Leybold UK Ltd.
Short Introduction to Cryo-Pumps and Refrigerators Dr Graham Rogers Leybold UK Ltd. Cryo Pumps Topics Physical principles of cryo-pumping Design and control of modern refrigerator cryo-pumps UHV and XHV
More informationLeak Detection. Kirsten Zapfe, DESY CAS Vacuum in Accelerators Platja D Aro, May 21, Special thanks to S. Holm, N. Mildner and A.
Leak Detection, DESY CAS Vacuum in Accelerators Platja D Aro, May 21, 2006 Special thanks to S. Holm, N. Mildner and A. Wagner Outline Introduction Leak Rate and Leak Types Leak Detection Methods Helium
More informationMatching Vacuum Pump to Process
A Journal of Practical and Useful Vacuum Technology From By Phil Danielson Matching Vacuum Pump to Process What s the best vacuum pump? is one of those maddening questions that can only be answered with
More informationDevelopment of Cleaning and Processing Techniques for UHV/XHV at Daresbury Laboratory Keith Middleman
Development of Cleaning and Processing Techniques for UHV/XHV at Daresbury Laboratory Keith Middleman ASTeC Vacuum Science Group STFC Daresbury Laboratory Accelerators + Vacuum Particle accelerators come
More informationChapter 8: Cryo-sorption pumps
Chapter 8: Cryo-sorption pumps Cryo-sorption pumps offer a clean, quiet, safe, vibration free and inexpensive way to rough pump a vacuum system. They are often used on vacuum systems that are sensitive
More informationThe Helium Leak Detector
The Helium Leak Detector Helium Leak Detector Main Components The main components of a helium leak detector are: 1. The analyzed, which enables to separate the tracer gas from other gases inside leak detector.
More informationPractical approach and problems in in-situ RGA calibration
Practical approach and problems in in-situ RGA calibration Oleg Malyshev and Keith Middleman Vacuum Science Group, ASTeC Accelerator Science and Technology Centre STFC Daresbury Laboratory UK Workshop
More informationA NOVEL SENSOR USING REMOTE PLASMA EMISSION SPECTROSCOPY FOR MONITORING AND CONTROL OF VACUUM WEB COATING PROCESSES
A NOVEL SENSOR USING REMOTE PLASMA EMISSION SPECTROSCOPY FOR MONITORING AND CONTROL OF VACUUM WEB COATING PROCESSES F. Papa 1, J. Brindley 2, T. Williams 2, B. Daniel 2, V. Bellido-Gonzalez 2, Dermot Monaghan
More informationGun Vacuum Performance Measurements February 2003
JLAB-TN-03-013 Gun Vacuum Performance Measurements February 2003 Marcy Stutzman Abstract. The vacuum in the polarized photoguns at Jefferson Lab is crucial to long lifetime operation of the polarized source.
More informationOutgas of Methane from NEG Coating
WS63: SURFACE PHENOMENA LIMITING PRESSURE IN VACUUM SYSTEM Outgas of Methane from NEG Coating Chia-Mu Cheng ( 鄭家沐 ) Vacuum Group NSRRC, Taiwan 18 /09/2010 e-mail : chiamucheng@nsrrc.org.tw 1 Application
More informationRevision 2013 Vacuum Technology 1-3 day Good Vacuum Practice 1 Day Course Outline
Revision 2013 Vacuum Technology 1-3 day Good Vacuum Practice 1 Day Course Outline This training course outline is intended to cover the following: Introduction to vacuum Measurement Lubricated rotary pumps
More informationEXERCISE 2: THE VACUUM SYSTEM
EXERCISE 2: THE VACUUM SYSTEM Because vacuum system techniques are important to all of experimental physics, every undergraduate student should have had some experience in them. This exercise ensures that
More informationFig. 1: Mechanical vacuum gauge (left) and capacitive vacuum gauge (right)
Dear Readers! This is your 4pvd Newsletter. We hope you enjoy the information it contains. If you wish to unsubscribe, please send a blank Email to unsubscribe@4pvd.de June 1 st, 2006, Issue No. 24 Principles
More informationChoosing a Quadrupole Gas Analyzer Application Note #9
Choosing a Quadrupole Gas Analyzer Application Note #9 Modern-day contamination control requirements for gas phase processes are constantly pushing the limits of performance of quadrupole gas analyzers.
More informationVacuum Science and Technology in Accelerators
Vacuum Science and Technology in Accelerators Ron Reid Consultant ASTeC Vacuum Science Group (ron.reid@stfc.ac.uk) Session 5 Materials Properties Relevant to Vacuum Aims To understand which mechanical
More informationExtreme High Vacuum: The Need, Production, and Measurement
Extreme High Vacuum: The Need, Production, and Measurement, Philip Adderley, Matt Poelker (Jefferson Lab) Polarized Electron Gun Group Newport News, Virginia Run by JSA for the US DOE What is XHV Extreme
More informationApplications of a Magnetic Sector Process Mass Spectrometer to the Analysis of Variable Vacuum Samples
Applications of a Magnetic Sector Process Mass Spectrometer to the Analysis of Variable Vacuum Samples Outline of Presentation Introduction Process Gas Analysis Magnetic Sector Mass Spectrometer Standard
More informationMajor Design Features
Major Design Features 3Flex Features Design Benefits Discussion 316 SS fittings and pneumatically actuated, hard-seal valves Provides virtually leak-free gas management with the lowest outgassing rate
More informationCryo-Evaporator Operation
Cryo-Evaporator Operation Cara Ricci November 25, 2003 Thin Film Deposition THE UNIVERSITY OF TEXAS AT DALLAS ERIK JOHNSON SCHOOL OF ENGINEERING DOCUMENT NUMBER: FA2003-TF-008 EDITION: 1.1 PAGE: 1 of 28
More informationUltrahigh Vacuum in Superconducting Synchrotrons A.Smirnov, JINR, Dubna, Russia
Ultrahigh Vacuum in Superconducting Synchrotrons A.Smirnov, JINR, Dubna, Russia Topics: - Pumping & outgasing of hydrogen - Cryogenic pumps & non evaporable getters for UHV - Superconducting accelerators:
More informationA novel class of Non Evaporable Getter (NEG) alloys with lower hydrogen equilibrium pressure and reduced outgassing properties
A novel class of Non Evaporable Getter (NEG) alloys with lower hydrogen equilibrium pressure and reduced outgassing properties P. Manini, FabrizioSiviero, A. Gallitognotta, L. Caruso, T. Porcelli,G. Bongiorno,
More informationINSTRUCTIONS. VP-100 Ion Pump. Model / R001
INSTRUCTIONS 87-900-130-01 (A) March 3, 2011 VP-100 Ion Pump Model 819-1490 / 819-1490R001 GENERAL INFORMATION This equipment is destined for use by professionals. The user should read this instruction
More informationREPRODUCIBILITY IN OPTICAL THIN FILM PROCESSING PART 1, THE VACUUM AND PUMPING
ABSTRACT REPRODUCIBILITY IN OPTICAL THIN FILM PROCESSING PART 1, THE VACUUM AND PUMPING Ronald R. Willey Willey Optical, Consultants, 13039 Cedar Street, Charlevoix, MI 49720, USA Ph 231-237-9392, ron@willeyoptical.com
More informationCanadian Light Source Inc. Vacuum Component Leak Test Technical Procedure
Canadian Light Source Inc. Vacuum Component Leak Test Technical Procedure CLSI Document 8.7.33.2 Rev. 2 Date: 2006-03-08 Copyright 2006, Canadian Light Source Inc. This document is the property of Canadian
More informationLeaks, contamination and closed loop control how RGAs make coating processes more profitable
Leaks, contamination and closed loop control how RGAs make coating processes more profitable Backup: What s an RGA Residual Gas Analyzer An instrument that is measuring the gas composition in a chamber
More informationChapter 5: Subatmospheric Total Pressure Gauges
Chapter 5: Subatmospheric Total Pressure Gauges The pressure gauges that will be described in this section are used to monitor the environment in a vacuum vessel so that processes conducted under subatmospheric
More informationOMNISTAR / THERMOSTAR. The efficient solution for gas analysis. Intelligent software. Wide range of applications.
OMNISTAR / THERMOSTAR The efficient solution for gas analysis. Intelligent software. Wide range of applications. OMNISTAR /THERMOSTAR The efficient solution for gas analysis. Intelligent software. Wide
More informationDetector Carrier Gas Comments Detector anode purge or reference gas. Electron Capture Nitrogen Maximum sensitivity Nitrogen Argon/Methane
Gas requirements Gases for packed columns The carrier gas you use depends upon the type of detector and the performance requirements. Table 520-1 lists gas recommendations for packed column use. In general,
More informationOperating Procedures for Metal Evaporator I
Operating Procedures for Metal Evaporator I Metal Evaporator I is intended as a tool and a training device. Understanding the operation of this equipment should give you a basic knowledge of vacuum and
More informationChemistry Chapter 11 Test Review
Chemistry Chapter 11 Test Review Multiple Choice Identify the choice that best completes the statement or answers the question. 1. Pressure is the force per unit a. volume. c. length. b. surface area.
More informationBEST KNOWN METHODS. Transpector XPR3 Gas Analysis System. 1 of 6 DESCRIPTION XPR3 APPLICATIONS PHYSICAL INSTALLATION
BEST KNOWN METHODS Transpector XPR3 Gas Analysis System DESCRIPTION The Transpector XPR3 is a third-generation, quadrupole-based residual gas analyzer that operates at PVD process pressures and is the
More informationResidual Gas Analysis Systems for Industry
HIDEN RC SYSTEMS QUADRUPOLE MASS SPECTROMETERS FOR RGA, GAS ANALYSIS AND PROCESS MONITORING The HAL RC systems are designed for RGA, gas analysis and process monitoring applications including leak detection,
More informationTechnical Specifications of Hydrogen Isotope Handling and Recovery System
SECTION - C TECHNICAL SPECIFICATIONS OF STORES AND DRAWINGS. Technical Specifications of Hydrogen Isotope Handling and Recovery System INSTITUTE FOR PLASMA RESEARCH GANDHINAGAR, GUJARAT 382428 ANNEXURE-I
More informationThe use of remote plasma emission spectroscopy as an alternative method of gas sensing for direct monitoring of vacuum processes
Enlighten Conference and Vacuum Symposium 12 th October 2017 The use of remote plasma emission spectroscopy as an alternative method of gas sensing for direct monitoring of vacuum processes Joe Brindley,
More informationASPECTS OF VACUUM TECHNOLOGY. (a) To see something of the operation of vacuum pumps; Then, we will use the vacuum system for one of two experiments:
ASPECTS OF VACUUM TECHNOLOGY In this exercise we wish (a) To see something of the operation of vacuum pumps; (b) To look at various vacuum gauges; Then, we will use the vacuum system for one of two experiments:
More informationAchieving Ultra-High Vacuum without (in-situ) Bakeout
Achieving Ultra-High Vacuum without (in-situ) Bakeout Matthew Cox Diamond Light Source, UK WS 63 Ávila September 2010 1 What is Diamond Light Source? The UK national synchrotron facility 3 rd generation
More informationOxford Instruments Austin, Inc.
User User Manual Manual Issue 01 / November 2013 / Oxford Instruments Austin, Inc. Issue 01 / November 2013 / Original Instructions Original Instructions Issue 01 / November 2013 / Oxford Instruments Austin,
More informationLow-Power Atmospheric Gas Sampling System Based on ART MS Sensor and NEG-Ion Pump
8 th Harsh Environment Mass Spectrometry Wokshop Low-Power Atmospheric Gas Sampling System Based on ART MS Sensor and NEG-Ion Pump Sept 22, 2011 Gerardo A. Brucker and G. Jeffery Rathbone Granville-Phillips
More informationA Mass Spectrometry Method for Water Vapour Transmission Rate (WVTR) testing to 10-6 gm/m 2 /day, utilising Deuterium Oxide
A Mass Spectrometry Method for Water Vapour Transmission Rate (WVTR) testing to 10-6 gm/m 2 /day, utilising Deuterium Oxide Stephen Swann Development Scientist www.vgs-plasticelectronics.com WVTR Illustration
More informationApproved by Principal Investigator Date: Approved by Super User: Date:
Approved by Principal Investigator Date: Approved by Super User: Date: Standard Operating Procedure BNC Commonwealth Dual Ion Beam Deposition System (CDIBS) Version 2010 February 14 I. Purpose This Standard
More informationStandard Operating Manual
Standard Operating Manual ARC12M Sputter Copyright 11.2015 by Hong Kong University of Science & Technology. All rights reserved. Page 1 Contents 1. Picture and Location 2. Process Capabilities 2.1 Cleanliness
More informationDr. José Miguel JIMENEZ CERN, Technology Department Head of the Vacuum, Surfaces and Coatings group
Vacuum Systems Outline Vacuum in Particle Accelerators Vacuum Basics Instrumentation & Pumping The LHC Case Vacuum in Particle Accelerators Why is Vacuum needed in particle accelerators? Vacuum aims to
More informationDevelopment of a high vacuum sample preparation system for helium mass spectrometer
Journal of Physics: Conference Series Development of a high vacuum sample preparation system for helium mass spectrometer To cite this article: P Kumar et al 2012 J. Phys.: Conf. Ser. 390 012056 View the
More informationSession 4B 11:00 11:30 AM. BASICS of MAINTENANCE and TROUBLESHOOTING of VACUUM DIFFUSION PUMPS
BASICS of MAINTENANCE and TROUBLESHOOTING of VACUUM DIFFUSION PUMPS Authors Bill Foley, Steve Palmer, Varian Incorporated Presenter Bill Foley, Varian Incorporated. Key Words: DIFFUSION PUMPS, MAINTENANCE
More informationName /74. MULTIPLE CHOICE. Choose the one alternative that best completes the statement or answers the question.
Ch 11 Gases STUDY GUIDE Accelerated Chemistry SCANTRON Name /74 MULTIPLE CHOICE. Choose the one alternative that best completes the statement or answers the question. 1) Which of the following statements
More informationOxford Instruments Austin, Inc.
User's User s Manual Issue 01 / March 2013 / OIAI Cryo-Plex 10 Oxford Instruments Austin, Inc. Issue 01 / March 2013 / Original Instructions Oxford Instruments Austin, Inc. is a wholly-owned subsidiary
More informationProcedure for Operating Columbia (Nevis) LHe Electron Bubble Chamber Cryostat. Version 5.1
Project: Novel Electron Bubble Particle Detector Procedure for Operating Columbia (Nevis) LHe Electron Bubble Chamber Cryostat Version 5.1 (Using side filling line) Hand Processed Changes HPC No. Date
More informationDC gun high voltage conditioning with Krypton gas Carlos Hernandez-Garcia October 2008
DC gun high voltage conditioning with Krypton gas Carlos Hernandez-Garcia October 2008 Index Background 1 High voltage processing with Helium gas 2 High voltage processing with Krypton gas 3 Some thoughts
More informationOxygen Contamination
MPMS Application Note 1014-210 Oxygen Contamination This application note describes potential sources for oxygen contamination in the sample chamber and discusses its possible effects. Molecular oxygen,
More informationNordiko Metal Sputtering System Standard Operating Procedure
Nordiko Metal Sputtering System Standard Operating Procedure Specifications : Target Size Gases used in the system Base pressure Sputtering pressure Substrates used Substrate size : 2 inch or 4 inch :
More informationSINGULUS TECHNOLOGIES
Fast Vacuum for Optical Disc Metallization and Photovoltaic Coatings B. Cord, M. Hoffmann, O. Hohn, F. Martin SINGULUS Technologies AG, Kahl am Main SINGULUS TECHNOLOGIES June 2014 SINGULUS Overview 25-June-2014-2
More informationPRad Target. Chris Keith JLab Target Group
PRad Target Chris Keith JLab Target Group Target Overview & Components Target Software Hazard Analysis and Mitigation Target Status, Performance& Remaining Work Installation Schedule Nov. 12, 2015 PRad
More informationUsage Policies Notebook for Xenon Difluoride (XeF 2 ) Isotropic Si Etch
Usage Policies Notebook for Xenon Difluoride (XeF 2 ) Isotropic Si Etch Revision date September 2014 2 Emergency Plan for XeF 2 Si Etcher Standard Operating Procedures for Emergencies Contact information
More informationHonors Chemistry - Problem Set Chapter 13 Classify each of these statements as always true, AT; sometimes true, ST; or never true, NT.
Honors Chemistry - Problem Set Chapter 13 Classify each of these statements as always true, AT; sometimes true, ST; or never true, NT. 1. Atmospheric pressure is 760 mm Hg. 2. The SI unit of pressure is
More informationDEVICES FOR FIELD DETERMINATION OF WATER VAPOR IN NATURAL GAS Betsy Murphy MNM Enterprises 801 N. Riverside Drive Fort Worth, Texas 76111
INTRODUCTION Water vapor in natural gas has more than a substantial effect on the quality of the gas stream. Without quality measurement of water vapor the gas is basically not saleable. Contracts are
More informationBASICS of MAINTENANCE and TROUBLESHOOTING of VACUUM DIFFUSION PUMPS
BASICS of MAINTENANCE and TROUBLESHOOTING of VACUUM DIFFUSION PUMPS Topics for Discussion Diffusion Pump Basics Maintenance Troubleshooting Topics for Discussion Diffusion Pump Fundamentals Maintenance
More informationat NIST: ultra-low outgassing rates
Traceable outgassing measurements at NIST: ultra-low outgassing rates and new materials James Fedchak Thermodynamic Metrology Group Sensor Science Division Physical Measurement Laboratory Vacuum Project:
More informationHigh Performance Mass Spectrometers
High Performance Mass Spectrometers For Vacuum and Semiconductor Process Monitoring Detailed product information / introduction MOCVD semiconductor processing Applications: XXCVD/MOCVD XXPECVD XXALD XXSputtering
More informationDRAFT. Operating Procedures for the NPDGamma Liquid Hydrogen Target in TA-53, Building MPF-35
Operating Procedures for the NPDGamma Liquid Hydrogen Target V0.03 11/26/05 1 DRAFT Operating Procedures for the NPDGamma Liquid Hydrogen Target in TA-53, Building MPF-35 Version 0.03 November 26, 2005
More informationSAES Packaging service. making innovation happen, together
SAES Packaging service MEMS Packaging service description Facility and operations Capabilities and future prospective Choose your type of service : Fast prototyping Process developments Packaging foundry
More informationGas Release from Solids, Materials for Vacuum and Leak Detector
VACUUM AND PLASMA SCIENCE AND TECHNOLOGY W9 Gas Release from Solids, Materials for Vacuum and Leak Detector Ming-Show Wong Nov. 2015 Gas Release from Solids Vaporization Thermal Desorption First Order
More informationTrillium US Inc. Cryo-Plex 10 Cryogenic High Vacuum Pump User s Manual Rev A / November 2015
97-00032-000 Trillium US Inc. Cryo-Plex 10 Cryogenic High Vacuum Pump User s Manual Rev A / November 2015 For information about Trillium US Inc., visit the Trillium US Inc. Web site at: http://www.trilliumus.com
More informationD R A F T. Operating Procedures for the NPDGamma Liquid Hydrogen Target at the BL 13. Version 1.00
D R A F T Operating Procedures for the NPDGamma Liquid Hydrogen Target at the BL 13 Version 1.00 October 06, 2010 Operating Procedures for the NPDGamma Liquid Hydrogen Target V1.00 6/10/10 2 Table of Content
More informationPlasma Sources and Feedback Control in Pretreatment Web Coating Applications
Plasma Sources and Feedback Control in Pretreatment Web Coating Applications Joseph Brindley, Benoit Daniel, Victor Bellido-Gonzalez, Dermot Monaghan Gencoa Ltd., Physics Rd, L24 9HP Liverpool, UK (+44)
More informationIUVSTA WORKSHOP WS-63 Surface Phenomena Limiting Pressure in Vacuum Systems REPORT TO IUVSTA. prepared by JOSÉ L. DE SEGOVIA
IUVSTA WORKSHOP WS-63 Surface Phenomena Limiting Pressure in Vacuum Systems INTRODUCTION REPORT TO IUVSTA prepared by JOSÉ L. DE SEGOVIA on behalf of the SPANISH VACUUM SOCIETY Madrid,February 1, 2011
More informationTotal Pressure Measurement Using Residual Gas Analyzers
Total Pressure Measurement Using Residual Gas Analyzers M. Maskell, Old Dominion University; G. Myneni, P. Adderley, Jefferson Lab; G. Brucker, Stanford Research Systems; C. Day, Forschungszentrum, Karlsruhe
More informationHow To Choose a Roughing/Backing Pump for the Turbo and Drag Family
A Journal of Practical and Useful Vacuum Technology From By Phil Danielson How To Choose a Roughing/Backing Pump for the Turbo and Drag Family The process of choosing the right high vacuum pump to suit
More informationLeak Checking Large Vacuum Chambers
Leak Checking Large Vacuum Chambers Technical Overview Vacuum Technologies Introduction Understanding the pump-down characteristics of a large vacuum vessel is critical for determining whether the vacuum
More informationAGILENT TURBOMOLECULAR PUMPS MEASUREMENT METHODOLOGY
AGILENT TURBOMOLECULAR PUMPS MEASUREMENT METHODOLOGY Agilent Vacuum Products: Our Committment to Quality Agilent s commitment to quality and Measurement s philosophy Reference Standards (PNEUROP, ISO)
More information2 Switching off ECRIS 3. 4 Acquire Beam Spectrum 4. 6 Vent Instrument Chamber 5. 7 Pump down Chamber 5. 8 Baking out Chamber 5.
Contents 1 Starting the ECR ion source (ECRIS) 2 2 Switching off ECRIS 3 3 Starting Mefisto Beam Analyzer 4 4 Acquire Beam Spectrum 4 5 Open Valve ECRIS/Chamber (Gate valve) 4 6 Vent Instrument Chamber
More informationVACUUM PUMP/ LEAK DETECTOR CATALOG
VACUUM PUMP/ LEAK DETECTOR CATALOG Mel Sattler Production Manager Thomas Dobler VP of Sales Chris Long CFO Ken Harrison President & CEO GNB is a company of technical experts serving other technology experts.
More informationGo/no-go test for the acceptance of components for unbaked vacuum sectors
Go/no-go test for the acceptance of components for unbaked vacuum sectors Paolo Chiggiato (Thanks to Sophie Meunier for the preparation of the presentation) Introduction CERN policy: All vacuum components
More informationAdvantages of Carrier Gas Leak Detection using Novel Helium or Hydrogen Leak Detectors with Specific Sensor Types
19 th World Conference on Non-Destructive Testing 2016 Advantages of Carrier Gas Leak Detection using Novel Helium or Hydrogen Leak Detectors with Specific Sensor Types Klaus HERRMANN 1, Daniel WETZIG
More informationAPPLICATION NOTE. GC Integrated Permeation Device
GC Integrated Permeation Device GC-integrated Design PPB to PPM Level Calibration No Cylinders or Regulators Required Option for Dual Ovens Cost Effective, Safe, Clean, Flexible, NIST Traceable Keywords:
More informationOOC RGA. Ion Pump 400 l/s. 8" ports with baked viton o-ring seals. Welsh rotary roughing pump 650 l/s manual isolation valve.
LASER INTERFEROMETER GRAVITATIONAL WAVE OBSERVATORY - LIGO - CALIFORNIA INSTITUTE OF TECHNOLOGY MASSACHUSETTS INSTITUTE OF TECHNOLOGY Technical Note LIGO-T000126-00- R 11/20/2000 Vacuum pressure at the
More informationVacuum pressure measurement (part 2) Indirect vacuum measurement devices
Royal Belgian Institute of Marine Engineers Vacuum pressure measurement (part 2) Indirect vacuum measurement devices by Frank Moerman, MSc., EHEDG Belgium With indirect vacuum pressure measurement devices,
More informationLOW PRESSURE EFFUSION OF GASES revised by Igor Bolotin 03/05/12
LOW PRESSURE EFFUSION OF GASES revised by Igor Bolotin 03/05/ This experiment will introduce you to the kinetic properties of low-pressure gases. You will make observations on the rates with which selected
More informationQuadruple mass spectrometers (transducer type)
Quadruple mass spectrometers that meet the need for sensitive analysis and low outgassing which were specifically designed to be controlled by PCs Quadruple mass spectrometers (transducer type) M-070QA-TDF,
More informationProudly serving laboratories worldwide since 1979 CALL for Refurbished & Certified Lab Equipment Varian 310
www.ietltd.com Proudly serving laboratories worldwide since 1979 CALL +847.913.0777 for Refurbished & Certified Lab Equipment Varian 310 310 LC/MS Manual System INCLUDES: 310-MS LC/MS triple quadrople
More informationFinal Gas Law Review
Name: ate: 1 t which temperature is the vapor pressure of ethanol equal to 80 kpa?. 48. 73. 80. 101 4 Gas Molecular Mass (g/mol) 2 4 17 20 The table shown lists four gases and their molecular mass. Which
More informationIntroductory Lab: Vacuum Methods
Introductory Lab: Vacuum Methods Experiments in Modern Physics (P451) In this lab you will become familiar with the various components of the lab vacuum system. There are many books on this topic one of
More informationSUBSTATION MAINTENANCE ELECTRICAL OPERATING PROCEDURE
Page 1 of 6 A. PURPOSE AND SCOPE This procedure establishes safe working practices for handling sulfur hexafluoride (SF 6 ) gas and release minimization practices. This document also specifies methods
More informationGenerating Calibration Gas Standards
Technical Note 1001 Metronics Inc. Generating Calibration Gas Standards with Dynacal Permeation Devices Permeation devices provide an excellent method of producing known gas concentrations in the PPM and
More informationCryogenics is the science of ultra low temperatures. Low temperatures are achieved by the liquefaction of gases.
CRYOGENICS SAFETY Introduction Cryogenics is the science of ultra low temperatures. Low temperatures are achieved by the liquefaction of gases. The gases which are most widely used in industry and research
More informationDetecting Hydrogen in Helium Streams. Samuel Goodman. Pittsford Mendon High School. Rochester, New York. Advisor: Dr.
1 Detecting Hydrogen in Helium Streams Samuel Goodman Pittsford Mendon High School Rochester, New York Advisor: Dr. Walter Shmayda Laboratory for Laser Energetics University of Rochester Rochester, New
More informationDissolved Oxygen Guide
Educat i onser i es Di ssol vedoxygengui de Dissolved Oxygen Guide Introduction Dissolved oxygen probes provide a convenient approach to essentially direct measurement of molecular oxygen. The membrane
More informationPressure Measurement
Pressure Measurement Manometers Sensors, Transducers Ashish J. Modi Lecturer, Dept. of Mech.Engg., Shri S.V.M. inst. Of Technology, Bharuch Pressure Pressure is a force per unit area exerted by a fluid
More informationGraphite and C-C materials for UHV applications
Graphite and C-C materials for UHV applications Prepared by J.M. JIMENEZ AT/VAC/SL Section Graphite Outgassing Measurements for UHV Applications Main topics What did we learn from past experiences? Static
More informationANL/APS/TB-16 ADVANCED PHOTON SOURCE ACCELERATOR ULTRAHIGH VACUUM GUIDE. Chian Liu and John Noonan
ANL/APS/TB-16 ADVANCED PHOTON SOURCE ACCELERATOR ULTRAHIGH VACUUM GUIDE Chian Liu and John Noonan CONTENTS 1. Ultrahigh Vacuum Overview..... 1 1.1 Vacuum..... 1 1.2 Sources of Residual Gas... 2 1.3 Material
More informationSection 8.1 Properties of Gases Goal: Describe the kinetic molecular theory of gases and the units of measurement used for gases.
Chapter 8 Gases Practice Problems Section 8.1 Properties of Gases Goal: Describe the kinetic molecular theory of gases and the units of measurement used for gases. Summary: In a gas, particles are so far
More information