ADDENDUM IMPORTANT DOCUMENT INVITATION TO BID ADDENDUM. OPENING DATE & TIME: January 3, 2018 at 3:00PM

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1 Procurement Services ADDENDUM IMPORTANT DOCUMENT INVITATION TO BID ADDENDUM ITB NUMBER: 1708MC OPENING DATE & TIME: January 3, 2018 at 3:00PM ITB TITLE: X-Ray Photoelectron Spectroscopy System ADDENDUM NUMBER: 1 ADDENDUM DATE: December 14, 2017 The purpose of this addendum is to: Extend the bid due date to January 3, 2018 at 3:00PM Answer questions received during the q/a period: Revise the system specifications listed on page(s) of the bid document. PLEASE ACKNOWLEDGE RECEIPT OF THIS ADDENDUM AND RETURN IT WITH YOUR BID. FAILURE TO SIGN AND RETURN WITH YOUR BID COULD RESULT IN REJECTION OF YOUR BID. PROPOSERS SIGNATURE COMPANY NAME PRINT OR TYPE PROPOSER S NAME ADDRESS

2 Procurement Services Answers to Questions: 1. Vendor Question: Does this system require NRTL certification? This is rarely required for Universities, and is optional in our pricing. UCF Answer: The NRTL certification is not required. 2. Vendor Question: The bid indicates, Final payment shall not be made until after the contract is complete unless the University has agreed otherwise. This indicates that the payment terms are negotiable at time of contract award. Is this correct, or are there required payment terms describing milestone payments at shipment, delivery, Installation & takeover, etc? UCF Answer: Vendor is to include the payment schedule on the price sheet. Invoices will be paid net Vendor Question: We are in the process of putting together a response for the University of Central Florida ITB No. 1708MC and have a question with regard to payment language in Section 4c of the general terms. Can you clarify the language Final payment shall not be made until after the contract is complete. Is that upon acceptance, installation? Also, are there standard payment terms? Ex: Net 30 days? UCF Answer: See the answer to question# 2.

3 Revisions to the System Specifications: Revision 1. Under Equipment, 2 nd bullet point The hemispherical analyzer should be equipped with a 128 channel, pulse counting delay-line detector system for both spectroscopic and image detection. The detector should operate in both a scanned and un-scanned (snapshot) mode for spectroscopy and a 2D mode for imaging. The hemispherical analyzer should be equipped with a 128+ Channel Pulse counting detector for 2D imaging, and a detector for spectroscopy. These may be separate detectors or a single detector. Revision 2. Under Equipment, 3 rd bullet point The instrument should be equipped with an imaging analyzer of the spherical mirror type to enable real- time, energy resolved XPS images to be observed and recorded without the requirement of sample or source scanning. The imaging analyzer should use the same detector as the spectroscopy analyzer. A spatial resolution of at least 1µm must be possible in the XPS imaging mode. The instrument should be equipped with an imaging analyzer of the spherical mirror type to enable real- time, energy resolved XPS images to be observed and recorded without the requirement of sample or source scanning. A spatial resolution of at least 1µm must be possible in the XPS imaging mode. Revision 3. Under Equipment, 6 th bullet point The instrument must provide angle resolved XPS (ARXPS). The minimum angular acceptance range of the electron analyzer should be 2.A dual excitation (Al/Ag) monochromatic source is required with the ability to switch between each mode automatically. The x-ray source should be capable of operating at power levels up to 600W.

4 The instrument must provide angle resolved XPS (ARXPS). The minimum angular acceptance range of the electron analyzer should be 2.A dual excitation (Al/Ag) monochromatic source is required with the ability to switch between each mode. Revision 4. Under Equipment, 7 th bullet point A fully automated sample stage is required with X, Y, Z and tilt modes. The sample tilt should be ± 90. An azimuthal rotation capability should also be included. The sample stage should accommodate samples up to at least 19mm in thickness A fully automated sample stage is required with X, Y, Z and tilt modes. The sample tilt should be ± 90. An azimuthal rotation capability should also be included. The sample stage should accommodate samples up to at least 12mm in thickness and ideally greater thicknesses. Revision 5. Under Equipment, 8 th bullet point Sample holders that have at least 65mm x 32mm of area available for sample mounting Sample holders that have at least 2275mm^2 of total sample mounting area should be provided. Revision 6. Under Equipment, 9 th bullet point The system should be equipped with a multi-sample storage and exchange system such that at least 3 sample holders can be accommodated simultaneously in the entry system. Automated exchange of these sample holders in/out is required with the capability to analyze samples while adding/removing samples to/from the entry lock. The system should be equipped with a multi-sample storage and exchange system such that at least 3 sample holders can be accommodated simultaneously in the entry system, with the capability to analyze samples while adding/removing samples to/from the entry lock. Revision 7. Under Equipment, 16 th bullet point

5 Water pressure boost pump should be added to increase the cooling water flow rate through the Al-anode during X-ray production. If required, Water pressure boost pump should be added to increase the cooling water flow rate through the Al-anode during X-ray production. Revision 8. Under Equipment, 17 th bullet point The instrument must be fitted with a monoatomic, dual mode Ar/Ar-Gas Cluster Ion Source for sputtering of organic and inorganic materials. The ion gun should also be capable of operating with other inert gases (such as He) for ISS. The system should be mass filtered to enable ion/gas cluster selection. A beam energy up to at least 20kV is required to provide sputtering of inorganic materials. The ion gun should be independently pumped to minimize gas loads into the analysis and/or preparation/entry chamber. The data system must control all of the parameters of the ion gun and the gas handling, including switching from monatomic to cluster ion mode. The system should include apertures and current measurement devices to support automated ion gun alignment routines. These apertures should be permanently mounted in the analysis chamber and always available to the user. The ion gun software should also support both automatic degas and filament conditioning procedures. The instrument must be fitted with a monoatomic, dual mode Ar/Ar-Gas Cluster Ion Source for sputtering of organic and inorganic materials. The ion gun should also be capable of operating with other inert gases (such as He) for ISS. The system should be mass filtered to enable ion/gas cluster selection. The ability to sputter inorganic material is required. The ion gun should be independently pumped to minimize gas loads into the analysis and/or preparation/entry chamber. The data system must control all of the parameters of the ion gun and the gas handling, including switching from monatomic to cluster ion mode. The system should include apertures and current measurement devices to support automated ion gun alignment routines. These apertures should be permanently mounted in the analysis chamber and always available to the user. The ion gun software should also support both automatic degas and filament conditioning procedures. Revision 9. Under Equipment, 26 th bullet point The sample stage should contain permanently mounted calibration samples for ease of maintenance and system verification

6 The XPS system should have the ability to keep all calibration samples permanently parked or contained within the vacuum system to provide quick and easy calibration of the instrument. Revision 10. Under Equipment, 30 th bullet point The instrument should be fully bakeable without the need to remove cables etc The instrument should be fully bakeable without onsite service engineer support. Revision 11. Under Equipment, 31 st bullet point The following minimum XPS performance specifications are required using the Ag 3d5/2 peak and Al Kα monochromatic radiation: Large area: o 0.5eV 600,000 cps o 0.60eV 1,500,000 cps o 1.00eV 3,500,000 cps <15µm spot: o 0.60eV 6,000 cps Imaging: o 3 µm (20% - 80% edge measurement) Insulator performance using PET o 0.68eV on COO component peak o 20,000cps on C-C/C-H component peak The following minimum XPS performance specifications are required using the Ag 3d5/2 peak and Al Kα monochromatic radiation. The test should be performed at the X-ray power which is recommended by Applications Scientists for use during normal analysis of samples by customers. The same analysis area should be used by each vendor: Large area: o 0.5eV 1,000 Counts/Sec/Watt

7 o o 0.60eV 2,500 Counts/Sec/Watt 1.00eV 5,800 Counts/Sec/Watt <20µm spot: o 0.60eV 6 Counts/Sec/Watt Imaging: o 3 µm (20% - 80% edge measurement) Insulator performance using PET o 0.82eV on COO component peak o 33 Counts/Sec/Watt on C-C or C-H component peak